Central Services

Cleanroom at CHyN

For further information about the clean room, running processes, and tools or if you are interested to use the cleanroom infrastructure please contact:

Thomas Finger, tfinger@chyn.uni-hamburg.de

The usage regulation and agreement can be downloaded as pdf here (currently available only in German) Nutzungsordnung

Cleanroom Team

Cleanroom manager

Thomas Finger


Cleanroom Technician

Bojan Bosnjak (DESY collaboration)

Cleanroom Technician

Matthias Hein

General information

  • Construction year 2017
  • Cleanroom class ISO 4
  • Divided into three areas:
    • Yellow light area (~100 m²)
    • White light area (~ 60 m²)
    • Gray room area (~150 m²)
  • Working space for more than 30 users simultaneously

The Cleanroom is divided into three working areas.
The yellow light area is intended for working with photosensitive resists and the cleaning and preparing of samples.
For vapor deposition of metals and etching of samples the white light area is provided.
The last working area is the gray room. It contains all the pumps and gas connections for the devices. The gray room area is mostly used by the technicians for the maintenance of the devices.
In addition to the three working areas of the cleanroom there is also a dressing room, where all cleanroom suits are stored for the users, and also a storage room, where all consumables are stored.

List of Tools

Manufacturer: Sentech
Type: SI 500 D
Construction year 2015
Deposition of SiO2 and Si3N4 with an accuracy of a few nanometers

Manufacturer: Sentech
Type: SI 500
Construction year 2015
Dry etching of Si, SiO2 and Si3N4
Bosch process for deep-RIE available

Manufacturer: Sentech
Type: SI 500
Construction year 2019
Dry etching for GaAs, InGaAs and AlAs with high selectivity

Physical Vapor Deposition
Manufacturer: Balzers Pfeiffer
Type: PLS 500
Construction year 1995
Thermal and electron beam evaporation of many metals

Manufacturer: EVG
Type: Nanoimprint EVG 501
Construction year 2014
For embossing and nano-imprinting applications with a high accuracy

Mask aligner
Manufacturer: Karl Süss
Type: MJB3
Construction year 2005
Contact exposure method

Optical microscope

Reflected light microscope from Leica used for control of the lithography.

Wet bench (4x)
Manufacturer: Arias
Construction year 2017
Integrated overflow basin, ultrasonic basin, spin coater, nitrogen gun and drying oven

Selection of Established Processes

Processing of nanochannels for the DNA characterization

For the manufacture of a Lab-on-a-Chip device at first a silicon master stamp is produced using photo- and electron beam lithography as well as reactive ion etching. Furthermore, the samples with the nanochannels are fabricated using nanoimprint lithography, which makes the optical mapping of a single DNA molecule possible.

Processing of contacted nanowires for monitoring of the cation exchange

To study cation exchange from CdSe to Ag2Se, individual nanowires are selectively contacted by UV laser lithography using the Heidelberg Instruments DWL66+ laserwriter. Precise control over the cation exchange process through I-V monitoring is achieved with these samples.

Processing of nanopores for single biomolecule experiments

GaAs membranes (20 nm thin) with open nanopores are produced for single molecule and particle experiments. In the future it shall be possible to measure biomolecule translocation for applications such as DNA sequencing. This process is in the optimization phase.

Processing samples for guided neuronal growth in 2.5D

2.5D cultured platforms with channels are produced using optical lithography and reactive ion etching to study topological guiding cues for neurite outgrowth in in-vitro neuronal cultures.

Processing of monolayer graphene samples with various designs

The production of monolayer graphene samples with various geometries and substrates for the investigation of the electronic properties at low temperatures are carried out in the cleanroom.
The samples are produced with high precision and in strictly defined environmental conditions.
With these samples it was possible to measure the electronic spin resonance in graphene.

General information

Anlage: Linde Kryotechnik L70

Verflüssigungsraten reines Gas:
Ohne LN2 Vorkühlung : 32 L/Std
Mit LN2 Vorkühlung: 56 L/Std

Verflüssigungsraten verunreinigtes Gas:
Ohne LN2 Vorkühlung: 25 L/Std
Mit LN2 Vorkühlung: 45 L/Std

Verflüssigte Menge Helium 2018: ~ 93 000Liter

Flüssigheliumtank: 5000 L

Helium Team

Helium Management

Dr. Lars Tiemann


Helium Technician

Alina Trumpjahn

Helium Technician

Gerd Neuber